片语

chemical vapor etching化学汽相蚀刻

chemical polish etching化学抛光刻蚀

chemical attack化学侵蚀

Photo-enhanced chemical wet etching method光辅助化学湿蚀刻法

chemical dry etching干法刻蚀

chemical corrosion[化学] 化学腐蚀

chemical wet etching光刻刻蚀

Chemical etching for electronics电子蚀刻

The Chemical Etching Method化学腐蚀法

英汉例句

• The affections of different surface treatments by mechanical polishing, chemical etching and photoetching to the properties of electrodes have also been discussed.

  探讨了机械抛光、化学抛光和光抛光等不同表面处理方法对电极特性的影响。

• The distribution of residual stress along depth gained through layer-by-layer measuring method after chemical etching is in line with that measured by multi-wavelength method.

  化学蚀刻后逐层测试所得应力沿深度分布与用多波长法测试结果趋势一致，大小略有差异。

• The chemical etching was an effective way for relieving of machining residual stress.

  化学蚀刻是消除铍材机加应力的有效方法。

• In order to reduce the thermal conductivity and heating capacity and increase the detectivity of array, the suspended structure was formed on silicon wafer by chemical etching of KOH.

  为了降低热导和热容，提高探测器的探测灵敏度，用KOH作化学腐蚀完全去除了线性阵列下方的硅衬底，形成悬空结构。

• The surfaces of the sample are decontaminated effectively first by chemical etching and then by heating directly in a stream of oxygen after placing sample on loading arm.

  先经化学腐蚀再在试样臂上用纯氧加热可以有效地消除试样的表面沾污。

• Also, severe biofouling, physical abrasion, and chemical etching of the glass may erode the sensing surface.

  严重的玻璃生物淤积、理磨损和化学腐蚀可能影响感觉表面。

• The chemical etching condition of CR-39 solid state nuclear track detector for neutron measurement was optimized by experiment.

  通过实验确定了CR - 39固体核径迹探测器用于中子测量的化学蚀刻条件。

• In view oi the problems existing in the silicon micro pressure sensors, this paper proposes the chemical etching techniques and the selective etching processes to control diaphragm thickness.

  并针对硅微压传感元件研制中存在的问题，提出采用化学腐蚀技术，选择性腐蚀工艺控制膜厚。

• Stencil manufacturing techniques include chemical etching laser cutting and electroforming.

  钢网制作技术包括化学腐蚀，镭射切割和电铸。

• According to the hydraulic transmission principle, a device for fabricating large cone Angle near-field optical fiber probe by means of dynamic chemical etching is developed.

  基于液压传递原理，设计出一种用动态化学腐蚀法制备大锥角近场光纤探针的装置。

• In the study, in order to get good precision of dimension and position of fine leads, chemical etching method is used to make high density double assess single-sided FPC.

  研究采用化学蚀刻聚酰亚胺的方法来制作双面连接的单面挠性板，以满足精细手指的尺寸和位置精度的要求。

• Stencil manufacturing techniques include chemical etching laser cutting and electroforming.

  钢网制作技术包括化学腐蚀，激光切割和电铸。

• The twins in NYAB and NGAB crystals were investigated by synchrotron radiation topography and chemical etching method.

  采用同步辐射形貌术结合化学腐蚀法，系统研究了NYAB和NGAB晶体中的孪晶结构。

• A simple dynamic chemical etching device based on siphon principle is developed for fabrication of optical fiber probes which are commonly used in near-field optical microscopy.

  基于虹吸原理，设计了一种动态化学腐蚀法的简易装置，用于制备近场光学显微镜光纤探针。

• Experiments are performed to confirm the chemical etching method for defining the crystallographic orientation of silicon single crystals.

  通过实验肯定了硅单晶的化学侵蚀定向方法，找出抛光液的最佳配比及抛光时间。

• In order to get stable and high efficiency thin-film CdTe solar cells that the CdTe thin films surface chemical etching before deposition of a metallic contact is very important.

  为了获得稳定高效的碲化镉太阳电池，在镀上金属电极前对碲化镉薄膜进行化学腐蚀是很重要的。

• This paper investigated the law of KPB crystal twinning using microcrystallography, chemical etching and optical method.

  本文采用显微结晶、化学浸蚀和光学方法研究了KPB晶体的孪生规律。

• The invention also discloses a chemical etching agent matched with the compound to take deep etch to glass, silicon water and metal material.

  本发明还公布了与光成像组合物配合使用，对玻璃，硅晶片、金属基材等进行深度刻蚀的化学刻蚀剂。

• The lengths and the widths of driving forks are measured with measuring microscopes in the main machining processes. The chemical etching of quartz is the main reason of machining errors.

  使用测量显微镜对石英音叉驱动叉指的长度和宽度在主要工艺过程中的变化进行了测量，其中以石英音叉化学腐蚀引入的尺寸误差较大。

• The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface.

  为了降低光在多晶硅表面的反射，采用化学腐蚀法在其表面制备了绒面。