the higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
in order to understand the generating process, an hydromechanics analysis is given. the gas cluster ion beam apparaturs is studied for engineering applications.
为搞清气体团束的产生过程,进行了流体力学分析。
the sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
离化团束的溅射产额比之单体离子束高100倍以上。
the unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.