a copper line having self assembled monolayer for use in ulsi semiconductor devices and methods of making the same are presented.
本发明提供用于ulsi半导体器件的具有自组装单分子层的铜线及其制造方法。
the copper line includes an interlayer dielectric, a self-assembled monolayer, catalytic particles on the monolayer, and a copper layer on the monolayer with the catalytic particles.