片语

discharge ion-plating放电离子镀

ion-plating technique离子镀膜技术

reactive ion beam plating反应离子束镀

ion n plating离子电镀法

ion film plating离子镀膜

ion-plating machine离子镀膜机

hollow cathode ion-plating空心阴极离子镀

arc ion-plating电弧离子镀

英汉例句

• the composition generally changes from alloy cathode target to alloy coating deposited by multi arc ion plating to some extent.

  采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。

• although oxygen radical containing different form that in plating solution, is the main existing form, but not discharge ion plating chromium;

  认为虽然镀液中的不同形态的含氧酸根，是主要存在型式，但是却不是放电离子；

• study on high specific capacitance of aluminum foil by multi-arc ion plating system;

  研究了直流电腐蚀对电解电容器阳极铝箔比容的影响。

• the ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating.

  离子掺金镀是多弧离子镀与磁控溅射有机复合技术，主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。

• multi-arc ion plating technology is an improved method of ion plating and it is a surface coating technology that uses arc as the fountain of vaporizing.

  多弧离子镀技术是离子镀技术的一种改进方法，它是把弧光放电作为金属蒸发源的表面涂层技术。

• high quality ito transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ito film.

  溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。

• the magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.

  磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。

• in this paper, the dlc films and titanium doped dlc films were deposited on az91mg alloy surface by arc ion plating (aip) in ar gas atmosphere and different pulse bias voltage.

  本论文采用电弧离子镀技术，纯氩气气氛下，在az91镁合金上制备了类金刚石薄膜及钛掺杂类金刚石薄膜。

• the langmuir double probe system based on virtual instrument was used to diagnose arc ion plating plasmas.

  本文利用基于虚拟仪器的朗缪尔双探针系统对电弧离子镀等离子体进行了诊断研究。

• the multi-element multi-layer nanometer film on piston ring surface is obtained with the ion plating surface treatment technology.

  采用离子镀表面处理技术，在活塞环表面获得了多元多层纳米膜。

• the influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (pbaip).

  针对脉沖偏压电弧离子镀技术，分析了影响基体沉积温度的各项因素及其影响程度。

• low voltage high current reactive ion plating is a new progress in the field of optical thin films deposition techniques.

  光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。

• black tin coating was prepared by multi arc ion plating technology, and wear resistance, corrosion resistance, heat proof property and absorption property of solar spectrum were also discussed.

  介绍了利用多弧离子镀工艺制备黑色氮钛膜，并对其耐磨损、耐腐蚀、热稳定性及太阳光谱吸收等性能进行了研究。

• the factors of influence on the quality of coated watch were analysed, the advantages of multi-arc ion plating are in-treoduced with examples.

  通过多种测试实例，分析了影响膜层质量的因素，显示了多弧离子镀技术在装饰膜方面有很好的发展前景。

• the conducting coatings are prepared on fiberglass surface through electroless plating copper and multi-arc ion plating aluminum in this paper.

  采用化学镀铜和多弧离子镀铝两种方法在玻璃纤维表面制备导电膜。

• the present paper focuses on the point that the magnetron sputtering ion plating process is anew technique for surface alloying of metallic materials.

  本文主要论述磁控溅射离子镀技术是金属材料表面合金化的一种新方法。

• the hard cr films were deposited on ni surface by means of magnetron sputtering, multi-arc ion plating and ion beam assisted deposition technique as a wear resistance layer of . gravure printing.

  研究了利用等离子体磁控溅射、多弧离子镀和离子束辅助沉积技术制备硬质铬薄膜，并薄膜的性能行了初步研究。

• in metal ion plating surface adopts advanced technology instead of the traditional method, the coating, coating color more even more stable, fall off.

  在金属表面采用先进的离子电镀技术替代了传统的镀膜方法，使得镀层颜色更均匀，更稳定，不易脱落。

• in this paper, a physical model about the effect of composition demixing between alloy coatings and alloy cathode material in multi arc ion plating is proposed.

  提出了一种关于多弧离子镀合金涂层成分离析效应的物理模型。

• the forming of ceramic layer includes plasma spray coating, ion plating film(pcvd), ceramic braze welding and ceramic insertion.

  陶瓷层的形成方法主要有等离子喷涂、离子镀膜、陶瓷钎焊及陶瓷镶嵌法。

• the said arc source for multi-arc ion plating and diffusing apparatus includes tubular cathode target and magnet steel strips inside the tube, which are parallel to axis and rotate integrally.

  本发明是一种应用于多弧离子镀、渗设备中的柱状阴极电弧源。包括管状阴极靶材、管内安装的平行于轴线的数根条形磁钢、磁钢整体做旋转运动。

• influence of pulse bias on surface properties of tin films fabricated by arc ion plating with large rectangle targets;

  研究了氧流量和脉沖偏压对薄膜相结构、沉积速率、表面形貌、薄膜硬度的影响。