英语释义

• the act of making a lithographic print

• a method of planographic printing from a metal or stone surface

片语

micrometer lithography微米结构光刻

laser lithography激光蚀刻

optical lithography光学平板刻法，光学制版

offset lithography[印刷] 平版胶印；胶版印刷术

Immersion lithography浸没式光刻

Lithography area黄光室

electron beam lithography[电子] 电子束曝光；[电子] 电子束蚀刻

Optical Lithography光学平板刻法，光学制版

Nanoimprint Lithography奈米印刷技术

imprint lithography压印光刻

Nano Lithography毫微光刻

英汉例句

• we also give the important results of our work as follows: 1. we generalize the quantum lithography with maximally entangled states(mes) to the one with nommaximally-entangled states.

  有如下几个创新点：1．把最大纠缠态的光刻方法推广到非最大纠缠态；

• the lithography systems maker also said it sees strong and continuous structural demand” for its products.

  阿斯麦公司还表示，旗下产品的需求会出现持续的强势增长。

• japan「s gigaphoton was established by ushio and komatsu as a 50-50 joint-venture company to develop, manufacture, sell and service excimer laser light sources for lithography tools in august of 2000.

  gigaphoton原为小松和ushio各占50%股份的合资公司,这家公司于2000年8月份成立，主要业务是开发，制造和销售光刻机用準分子激光器光源，并为顾客提供服务，同时还有研发制造248nm/193nm（干式/液浸式系统）光刻机。

• inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.

  用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。

• he believes this would be easier to carry out than the lithography currently used to manufacture squids because it would require no photosensitive mask and no chemicals to wash away that mask.

  他相信，制造squid时，这项技术的应用比现代的印刷集成电路技术要容易，因为它不需要有光敏涂层，也不再需要化学物质洗去涂层。

• the paper introduces the application of inverter in the reform of homemade single- double-color singleton paper lithography machine, followed with some functional demands for inverter.

  本文主要介绍了变频器在国产单双色单张纸平版印刷机改造中的应用，以及对变频器的一些功能的要求。

• the calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.

  提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。

• next, a mixture of two polymers is added to the metal substrate to create patterns, a process known as diblock copolymer lithography (bcp).

  接下来，在金属基板上添加一种由两种聚合物组成的混合物来制作样品，这个工艺过程被称为嵌段共聚物光刻（bcp）。

• the process of su-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.

  初步研究了su-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。

• the dutch maker of lithography systems for the chip industry said it’s set to log sales of 5 billion euros ($6.74 billion) for 2011, and announced a share buyback program of up to €1 billion.

  阿斯麦公司公布，预计2011年销售额达到50亿欧元（约合67.4亿美元），同时宣布了高达10亿欧元的股票回购计划。

• existing immersion lithography tools will serve flash makers down to geometries of less than 10nm, two generations from today」s processes, he said.

  他还表示，现有的液浸式光刻机将会继续服役到10nm或更高级别的节点制程。

• electron - beam lithography with a novel multilevel resist structure defines the pattern.

  采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

• therefore, the technology of euvl is becoming a hot point in international lithography field.

  因而，该技术也是目前国际上先进光刻领域研究的热点。

• several companies and research institutes are currently developing e-beam tools for direct write lithography and other niche applications.

  尽管如此，目前仍有许多公司和研究机构在继续研究和开发电子束光刻设备。

• at 22-nm, however, intel will reportedly use two lithography vendors for the critical layers.

  不过据称intel在22nm节点制程会同时使用两家光刻机厂商的产品制造其关键层。

• asml provides lithography systems for the semiconductor industry.

  阿斯麦公司主要为半导体行业提供刻录系统。

• two main installation methods of lithography projection lens were studied in this paper, and their characteristics were discussed.

  对两种主要的光刻投影物镜安装方式进行了研究，并对各自特点进行了讨论。

• japanese companies have a similar grip on, for example, bonding material for integrated circuit packages and the lithography machines (called steppers) to make lcd panels.

  日本公司对诸如集成电路块的粘合材料和生产液晶显示屏（lcd）面板的光刻机（称为：步进器）、有相似的掌控能力。

• the tool is reportedly being used for the development of intel corp.’s 22-nm logic node. with a different tool, nikon was the sole lithography vendor for the critical layers at intel’s 32-nm node.

  据报道intel正在使用这款光刻机开发其22nm节点制程逻辑芯片产品.目前尼康是intel32nm制程芯片关键层制造用光刻设备的独家供应商。

• luc van den hove, president and ceo of imec is expected to announced the move during his keynote speech at today’s spie advanced lithography conference.

  imec机构的总裁兼ceolucvandenhove会在今天召开的spie高级光刻技术会议（spieadvanced lithographyconference）上所作的演讲中介绍这台光刻机的有关信息。

• durable , white, water - resistant, low shrinkage resin for stereo lithography for sla system.

  应用于立体光刻技术的耐久性，白色，防水和低收缩的树脂。

• meanwhile, liu said the key challenges for the 22-/20-nm node will be power, lithography, among others. ''at 22-nm, lithography will become more of a gating item,’’ liu said.

  另外，liu还表示22/20nm节点最主要的挑战是功耗控制和光刻技术有关的两大难题，他表示：“在22nm节点，光刻技术将成为决定成败的重要因素。

• as a newly coming micro fabrication technology, soft lithography use elastomeric stamp to replace hard stamp in traditional lithography to fabricate micro patterns and structures.

  作为一种新型的微图形复制技术，软光刻技术用弹性模替代传统光刻技术中使用的硬模来产生微形状和微结构。

• the high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in ic factories.

  传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。

• but with the development of technology, the cost of lithography equipment increases.

  但是随着技术的进步，光刻设备的价格也随之上升。