photoetching
n. 光刻,[电子] 光刻法;照相腐蚀法;照相感光制凸版
2025-10-09 12:16 浏览次数 11
n. 光刻,[电子] 光刻法;照相腐蚀法;照相感光制凸版
1. photoengraving
electrolytic photoetching电解光刻
lithographic process光刻;平版印刷法
photoetching model光刻模型
cd photoetching光盘刻录
photoetching glue光刻胶
photoetching detail光刻
photoetching material[电子]
photoetching cements光刻胶
Fodel Photoetching光刻成图技术
laser photoetching激光光刻
the affections of different surface treatments by mechanical polishing, chemical etching and photoetching to the properties of electrodes have also been discussed.
探讨了机械抛光、化学抛光和光抛光等不同表面处理方法对电极特性的影响。
in this paper, an optical alignment system is introduced using gratings with different constant for the step projection photoetching machine.
介绍一种在分步投影光刻机中,采用不等栅距光栅进行对準的系统。
this paper describes the principle and the properties of excimer laser, and introduces the results of the excimer laser photoetching experiments and φ3in substrate uniformity compensating test.
详细叙述了準分子激光的工作原理和工艺特性,介绍了準分子激光光刻实验及φ3英寸基片均匀性补偿试验的研制结果。
photoetching polysilicon forms force sensitive resistance bar.
多晶硅经光刻后便形成力敏电阻条。
brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.
采用高频脉沖微束等离子弧做为电子管阴极和光刻栅极装配钎焊工艺的热源,提高了钎缝质量和产品的可靠性。
aligning method, aligning substrate, photoetching device and component manufacturing method.
对準方法,对準基底,光刻装置和器件制造方法。
at same time, it has been pointed out that the photoetching technology and printing technology have important application in color pdp display.
同时,也指出光刻技术和印刷技术在彩色pdp显示器中的重要应用。
sucker, photoetching projective apparatus, method for producing sucker and component producing method.
吸盘,光刻投影设备,制造吸盘的方法和器件制造方法。
when the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.
本发明探针诱导光刻薄膜用于探针诱导表面等离子体共振光刻将大大降低刻蚀线宽。
the exposure system is an important component of the photoetching equipment and its performance is one of the main properties of the equipment.
曝光系统是光刻机的重要组成部分,其性能的好坏也是光刻机性能的主要指标。
used for iron pentacarbonyl encapsulated compound and chemical catalysts, and it's the idea raw material of semitransparent photoetching films for integrated circuits.
的翻译是:使用为铁pentacarbonyl浓缩了复合和化工催化剂,并且它是半透明的photoetching的影片想法原材料集成电路的。
in addition, the method is compatible with the matured photoetching process, thereby reducing the cost and being beneficial to industrial production.
另外,本方法也与成熟的光刻工艺兼容,降低了成本,有利于工业生产。
using the photoetching method to form the photoetching reverse pattern of the hole structure in the transparent medium underlay, depositing metal film on the underlay from upwards to downwards;
制造时在透明介质衬底上用光刻法形成要作孔隙结构的厚光刻胶反图案;在衬底上从上往下淀积金属膜;
the material of oar shape chemistry that phosphor turns indium chip to call photoetching glue through a kind on product line has package.
磷化铟晶片在出产线上经过一种称为光刻胶的浆状化学物质进行包裹。
it can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.
广泛应用于微电子加工,光刻技术和扫描显微技术中的聚焦或成像系统中。