sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow.
本发明描述使用定向反应物气流和相对于所述气流移动的基板的次大气压化学气相沉积。
the traditional ways to obtain polycrystalline film include solid phase crystallization (spc), low pressure chemical vapor deposition (lpcvd) and excimer laser annealing (ela).
目前常用的几种获得多晶薄膜的方法包括:低压化学气相沉积、固相结晶、準分子激光晶化等。
as an important inter-layer dielectric, bpsg thin films deposited by atmospheric pressure chemical vapor deposition (apcvd) were used widely in most wafer techniques.
(硼磷硅玻璃)薄膜作为一种重要的层间介质,在半导体集成电路中广泛使用。