thermal annealing中文,thermal annealing的意思,thermal annealing翻译及用法

2025-12-18 04:08 浏览次数 16

thermal annealing

[ˈθə:məl æˈni:liŋ]

加温退火;热处理(退火)

thermal annealing 例句

英汉例句

  • at last, the effect of rapid thermal annealing on the electrical properties of hemt material is studied.

    最后我们研究了快速退火对hemt材料电学性能的影响。

  • the properties of pzt film after rapid thermal annealing (rta) was tested by x-ray diffraction (xrd) for orientation of crystallization, by rt66a for electrical characteristics.

    经快速热退火(rta) 处理后,用x射线衍射(xrd)测试了膜的结晶取向,用rt66a测试了膜的电学性能。

  • the influence of thermal annealing on dkdp crystals grown at different rates was studied.

    分别对不同生长速度的dk dp晶体进行了退火处理。

  • steady state thermal annealing was proposed by the authors as a means to check the relevance of the calculated free energy diagrams at some important compositions.

    作者提出了用稳态退火实验来校验计算的自由能图在一些重要成份点的相对能态的合理性。

  • in this paper, the influences of conventional furnace annealing (cfa) and rapid thermal annealing (rta) and annealing time on sto films were systematically studied.

    系统研究了cfa与rta两种热处理方式以及热处理温度和时间对sto薄膜微结构的影响。

  • the results show that a thermal annealing at the proper temperature of experiments can significantly improve the optical homogeneity of the crystals, especially for the crystal grown at a rapid speed.

    结果表明,适当温度的退火处理能有效地提高晶体的光学均匀性,尤其是对快速生长的晶体质量提高更为显着。

  • polycrystalline nickel silicide film formed on thin oxide by rapid thermal annealing (rta) has been investigated by capacitance voltage ( c v ) measurements.

    本文研究了在薄二氧化硅层上快速热退火(rta)形成的多晶硅化镍膜的电特性。

  • raman scattering spectra of silicon nanocrystals and their dependence on thermal annealing have been measured at the right angle scattering configuration.

    在直角散射配置下测量了纳米硅样品的拉曼散射谱及其退火温度的关系。

  • the ccto films prepared with different preheating temperature after rapid thermal annealing treatment have the smaller dielectric loss, and the values lie in between 0.1~0.35.

    不同预烧温度所制备的ccto薄膜,经快速热退火处理后,其介电损耗值较小,基本在0.1~0.35之间。

  • after thermal annealing about 60% of radiation damage induced by implantation can be restored.

    在热退火后,约60%的注入引起的辐射损伤可以得到恢复。

  • up to 900℃, thermal annealing residual damage amounts to 35%.

    热退火温度达到900℃时,剩余晶格损伤还有35%;

  • microstructure of homemade modified 316l stainless steels and its thermal annealing behavior are studied by the positron annihilation lifetime technique.

    采用正电子湮没寿命方法研究了国产改进型316l不锈钢的微结构及其温度变化。

  • an extensive study has been carried out on the effect of thermal annealing on carrier lifetime and surface recombination velocity, which affect the final output of the solar cell.

    我们又进一步研究了退火对少数载流子寿命和表面复合速率的影响,因为其对太阳能电池的最终效率影响很大。

  • thermal annealing process with a combination of hydrothermal annealing can improve wafers' optical properties quickly and efficiently.

    将热退火过程与水热溶液退火进行了结合,能快速有效地提高晶片的光学性能。

  • partially crystallized ba ferrite thin films were prepared by the strict controlling of the rapid thermal annealing time for as deposited amorphous thin films.

    对于沉积态非晶薄膜,通过严格控制其快速热处理时间,从而制备出了部分晶化钡铁氧体薄膜。

  • we employ the magnetic sputtering method to deposit amorphous tungsten films and investigate their thermal annealing process.

    对使用磁控溅射法沉积的钨薄膜进行了热退火研究。

  • the results indicate that the pyrochlore phase was restrained successfully by layer-by-layer rapid thermal annealing method.

    实验结果表明,逐层快速退火工艺可有效抑制焦绿石相的形成;

  • using spectroscopic ellipsometry, the influence of thermal annealing on optical properties of the plasma-deposited hydrogenated amorphous carbon films is investigated.

    用椭圆偏振光谱法研究了热处理对射频辉光放电淀积的氢化非晶碳膜光学性质的影响。

  • they can be passivated with hydrogen plasma annealing and reactivated by subsequent thermal annealing in vacuum.

    氢等离子体退火对电活性的位错态有显着的钝化作用。

  • the results indicate that the pyrochlore phase is restrained successfully by the layer-by-layer rapid thermal annealing method.

    结果表明:层层快速退火工艺,可有效抑制焦绿石相的形成。

  • compared with conventional furnace annealing, pbtio3 thin films by rapid thermal annealing had smaller, denser and uniform crystal grains in size with better crystallographic quality.

    与常规晶化相比,快速晶化处理的薄膜结晶质量好,晶粒较小、分布均匀致密。

  • by considering the surface morphology and the x-ray diffraction analysis, rapid thermal annealing is better than conventional annealing.

    从表面形貌和x射线衍射图综合分析,快速退火的晶化效果要优于常规退火。

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