electron beam evaporation中文,electron beam evaporation的意思,electron beam evaporation翻译及用法

2025-10-31 11:23 浏览次数 9

electron beam evaporation

英[iˈlektrɔn bi:m ɪˌvæpəˈreɪʃən]美[ɪˈlɛkˌtrɑn bim ɪˌvæpəˈreʃən]

[电子] 电子束蒸发

electron beam evaporation 片语

片语

Electron Beam Gun Evaporation电子枪蒸镀法

Reactive Electron Beam Evaporation电子束反应蒸镀法

electron beam evaporation technique电子束蒸发

electron beam evaporation system电子束蒸镀系统

electron beam evaporation deposited电子束蒸发沉积

Electron Beam Evaporation 1电子束蒸镀机

electron-beam evaporation deposition电子束蒸发沉积

Ion-assisted electron-beam evaporation子辅助蒸镀

electron beam vacuum evaporation电子束真空蒸发

electron beam evaporation 例句

英汉例句

  • titanium films which are deposited on si wafers by electron beam evaporation are rapid thermal annealed in a vacuum at temperatures between 550 and 1000℃ for 10 sec and at 850℃ for 4-30 sec.

    用电子朿蒸发方法在硅上蒸上一层膜钛后,在真空中进行550—1000℃的10秒钟等时快速热退火以及从4秒到30秒的850℃等温快速热退火。

  • tungsten oxide and nickel oxide films were prepared by electron beam evaporation method, and the effect of annealing techniques of the electrochromic properties of these films was discussed.

    本论文利用电子束蒸发方法制备氧化钨、氧化镍薄膜的基础上,研究了热处理工艺对于薄膜电致变色性能的影响。

  • the flat polarizer was prepared by electron beam evaporation and its optical performance was measured by lambda900 spectrometer.

    采用电子束蒸发沉积技术制备了平板偏振膜。

  • zro_2 films deposited by electron beam evaporation method are treated by oxygen plasma.

    用低能氧等离子体对电子束热蒸发后的沉积氧化锆薄膜进行了后处理。

  • the article introduces the basic theory of electron beam evaporation technique, its key technology, recent level of development and some tipicalsamples of application.

    本文介绍电子束蒸涂技术的基本原理、关键技术、目前发展水平、以及一些典型应用实例。

  • methods:the nature ha films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

    方法:用电子束蒸发和射频磁控溅射两种技术制备了天然ha薄膜。

  • by means of electron beam evaporation and ion source auxiliary technology, the paper shows the influence of the number of layers on the quality of film polarization beam splitter prism.

    采用电子枪蒸镀离子源辅助技术,讨论了薄膜层数对偏振分束棱镜性能的影响。

  • ta2o5 films are prepared on bk7 substrates with conventional electron beam evaporation deposition.

    ta2o5薄膜采用传统的电子束蒸发方法沉积在bk7基底上。

  • we report process of si quantum wire and dot based on ebl and rie processes and process of nano structure metal gate based on ebl, electron beam evaporation and lift off techniques.

    本文介绍了几种用电子束光刻、反应离子刻蚀方法制备硅量子线、量子点和用电子束光刻、电子束蒸发以及剥离技术制备纳米金属栅的工艺方法;

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