the influence of secondary electron emission on efficiency and backflow can be improved through an elaborate electron optics design.
在研究二次电子特性及成像机理的基础上,设计了二次电子成像系统。
in this paper, the high peak power multi-beam klystron(mbk) was preliminarily researched and the electron optics system and rf interaction system of an s-band 50 mw mbk were studied.