the positive photoresist composition which is suitable for used in a resist coating method by a discharge nozzle system can be provided according to the invention.
根据本发明可提供能够适用于排出喷嘴式的抗蚀剂涂布法的正型光致抗蚀剂组合物。
we can better control the positive photoresist figure, provide a reference for making mems and moems, it is of an important instructional significance for deep relief of micro structure.
通过对光刻工艺过程的研究,可为较好地控制正性光刻胶面形,制作微机械、微光学器件提供了参考依据,对微浮雕结构的深刻蚀具有重要的指导意义。
the mechanisms of dissolution inhibition of positive photoresist based on novolak(nvk)-diazonaphthoquinone(dnq), including(1) the molecular hydrogen bonding interactions between novolak and dnq;
本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理,主要包括(1)分子间氢键作用机理;