silicide中文,silicide的意思,silicide翻译及用法

2026-03-22 09:30 浏览次数 34

silicide

英['sɪlɪsaɪd]美['sɪlɪˌsaɪd]

n. [无化] 硅化物

silicide 英语释义

英语释义

  • any of various compounds of silicon with a more electropositive element or radical

silicide 片语

片语

ytterbium silicide硅化镱

uranium silicide硅化铀

Vanadium silicide硅化钒

Molybdenum silicide硅化钼

hydrogen silicide硅化氢

silicide refractory硅化物耐火材料

Cobalt silicide硅化钴

eutectic silicide共晶硅化物

boron silicide硼化硅

silicide 例句

英汉例句

  • the silicide layer formed at interface was thought to induce the in plane magnetic anisotropy in the sandwiches, which consequently resulted in the high field sensitivity of gmr.

    这个硅化物界面层诱导了三明治膜的平面内磁各向异性,从而导致了易轴上高灵敏度巨磁电阻效应。

  • in this paper, the titanium silicide films processed by pecvd method have been studied.

    本文研究了用pecvd法制备硅化钛膜的卫艺。

  • a second anneal is performed to convert the metal rich silicide phase formed by the two thermal cycles of the first anneal into a metal silicide (68) phase that is in its lowest resistance phase.

    进行第二次退火以便将通过第一次退火的两次热循环形成的富金属硅化物相转化成处于其最低电阻相的金属硅化物(68)相。

  • our company is a joint-stock company operated under the modern corporation system. we have a production line of organic chloride silicide nitride compounds and etc.

    本公司是一家集医药中间体研发、生产、销售为一体的、按现代企业制度运作的股份企业。目前产品以有机卤化物、有机硅化物、氮化物系列产品为主。

  • in particular, when the refractory metal silicide film is a tungsten silicide film, the concentration of cu is preferable that it is in the range of 0.1 to 1.0 wt. %.

    特别是,当难熔金属硅化物薄膜是硅化物薄膜的钨,铜的浓度最好,它在0.1至1.0范围为野生。%。

  • the silicide may provide a template for crystallization, decreasing the defect density of the silicon and improving its conductivity.

    硅化物可以提供用于结晶化的模板,降低了硅的缺陷密度并且提高了其导电性。

  • the precipitation of silicide may promote the intensity of slip and is the minor reason for the ductility loss.

    而硅化物析出协同促进位错滑移集中化,是热稳定性下降的次要因素。

  • other silicide layers (50.4-50.6) are on the tops of the source, drain and polysilicon gate.

    其它硅化物层(50.4-50.6)处于源极、漏极和多晶硅栅极的顶部。

  • the titanium silicide film has its potential advantage in forming a gate electrode and interconnection for vlsi because of its low resistivity and some other good characteristics.

    硅化钛薄膜由于电阻率低和其它一些良好特性,在vlsi的栅电极和互连线中显示出它潜在的优势。

  • the conditions of forming tungsten silicide with as ion beam mixing have been studied by means of rutherford backscattering.

    本工作用卢瑟福背散射研究了离子束混合方法形成硅化钨的条件。

  • the polysilicon tiles (14.1, 14.2) have silicide layers (50.1, 50.2).

    所述多晶硅瓦片(14.1、14.2)具有硅化物层(50.1、50.2)。

  • first of all, we have investigated the thermal stability of nickel silicide with zr capping.

    首先,我们对锆覆盖在镍上后形成的金属硅化物的热稳定性作一系列的研究。

  • the invention discloses single-phase gadolinium-silicon compounds and the method for preparation, and relates to a rare earth silicide material.

    本发明单相釓硅化合物以及制备方法,涉及稀土硅化物材料。

  • the metal silicide layer prepared by the method has high heat stability and controllable growth speed.

    本发明方法制备的金属硅化物层热稳定性高,且生长速度可控。

  • the solid by-product is obtained by imitating the magnesium silicide method which is used to produce silane in industry.

    以硅化镁、氯化铵与液氨为原料,模仿硅化镁法制备硅烷气体的工艺,获得反应生成的固体副产物。

  • and by the means of silicide , resist layer and aluminium multilayer metal lines , the questions of ohmic-contact and a1 electron mobility are resolved.

    采用硅化物阻挡层和a1多层金属布线方法,解决了欧姆接触和铝的电迁移问题。

  • the invention is a preparation method of metal silicide film by microwave hydrogen plasma, relates to film preparation field.

    一种微波氢等离子体制备金属硅化物薄膜的方法,用于薄膜制备领域。

  • polycrystalline nickel silicide film formed on thin oxide by rapid thermal annealing (rta) has been investigated by capacitance voltage ( c v ) measurements.

    本文研究了在薄二氧化硅层上快速热退火(rta)形成的多晶硅化镍膜的电特性。

  • carbene and silylene are two kinds of reactive activity intermediates which belong to carbide and silicide separately, but they are quite similar.

    碳烯和硅烯是分属于碳化物和硅化物中的两类反应活性中间体。两者甚为相似。

  • the silicide components in cuticle of rice straw stem, leaf sheath and rice shaft were studied by means of xps-peak-differentation-imitating analysis.

    用xps测定结合分峰拟合分析,研究稻草茎部、叶鞘、穗轴等部位皮层中硅化物的组成。

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