aiming at the lost accuracy happened in hel(hot embossing lithography) because of thermal distortion , room-temperature imprint lithography is proposed.
针对热压印光刻工艺中因热变形而导致精度丧失的问题,提出了冷压印光刻。
abstr: the principle of uv nano imprint lithography (uv-nil) and system designed by ourselves are introduced.
文章摘要:介绍了紫外纳米压印技术原理和自主研发的压印系统。
the mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺,其模具的制造是目前面临的难点。