The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明:屏极电压和溅射气压对离子束均匀性和束流密度影响显着;
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。