片语

ion beams bombardment离子束轰击

ion n bombardment离子轰击

ion beam bombardment离子束轰击

ion-bombardment heat离子轰击热处理

argon ion beam bombardment氩离子束轰击

ion-bombardment experiment离子轰击试

ion beam bombardment technology离子束轰击技术

ion-bombardment treatment离子轰击热处理

英汉例句

• it is of great importance to improve the properties of dlc films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.

  在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善dlc膜的性质有重要意义。

• the results indicate that the ion bombardment enhances the ionization of oxygen, promotes the oxygen permeation and facilitates the formation of the oxide of low valence states of ti.

  结果表明，离子轰击加强氧的离化、促进渗氧，有助于低价态氧化物的形成。

• if the vacuum near the cathode is too poor, it will generate spark, gas ionization and ion bombardment on cathode, which can result in a fast attenuation of the emission current.

  如果碳纳米管阴极附近的真空度太低，将产生打火、气体电离、离子回轰阴极等问题，将导致阴极发射电流的迅速衰减。

• aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.

  以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。

• an process of ion bombardment heat treatment for high dimension precision slender rods was discussed through treating the valves with different loading ways, heating temperature, and heating ways.

  以气门的离子轰击热处理为研究对象，通过对装炉形式、处理温度及工艺方法等试验，探讨了尺寸精度要求较高的细长桿件的离子热处理工艺。

• this avoids ion bombardment on an electron emitter (111) of the x-ray tube (100).

  这避免了对x射线管（100）的电子发射器（111）的离子轰击。

• from a quantitative analysis we think the reason for that phenomenon is that the ion bombardment destroys the cathode emission.

  通过具体的分析本文认为真空二极管的发射不稳定和退化是因为离子轰击对器件发射性能的破坏。

• the authors think that the high temperature on polymer local surface produced by ion bombardment is the main cause of artifacts on sample surface treated by ion-etching.

  本文作者认为等离子体轰击高聚物表面引起的局部高温是离子刻蚀后试样表面出现伪迹的重要原因。

• at the same time, the influence of plasma charging and ion bombardment on the quality of silicon oxide are analyzed.

  我们同时对反应离子刻蚀工艺中的等离子体充电效应和离子轰击对氧化硅造成的损伤进行了讨论。

• the surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.

  本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的凈化作用。

• on the gold-coated substrates, the ion bombardment remains effective throughout the growth process.

  所以只有呈电中性的离子才能轰击正在生长的膜。