silicon oxide
二氧化硅
2026-03-22 09:31 浏览次数 26
二氧化硅
silicon dioxide[无化] 二氧化硅
silicon rich oxide sro富硅氧化硅
high silicon zinc oxide高硅氧化锌矿
silica(Silica)人名;(罗)西莉卡
de-silicon iron oxide脱硅氧化铁
silicon n oxide二氧化硅
silicon based oxide硅基氧化物
silicon-oxide polyhedron硅氧多面体
aluminum silicon hydroxide oxide硅铝酸
high silicon zinc oxide ore高硅氧化锌矿
porous-silicon tungsten oxide gas sensors多孔硅基氧化钨气敏传感器
the porous silicon oxide materials had good thermal stability and skeleton did not decompose even at 600~800 ℃.
多孔氧化硅材料的热稳定性良好,600~800 ℃时骨架不发生分解。
in the present embodiment, the interelectrode insulating film 8 is formed of a silicon oxide film or a silicon nitride film having a thickness of 400 nm or below.
在本方式中,电极间绝缘膜8,由膜厚度为400nm以下的氧化硅膜或者氮化硅膜构成。
abstract in this paper, the electrical performance and breakdown mechanism of thin silicon oxide have been discussed.
本论文主要研究薄氧化硅的电性能行为和击穿机理。
silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
本文利用射频磁控溅射方法,在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
silicon oxide (sio 2 ) and iron oxide (fe 2 o 3 ) in dust are important because of their abrasive nature.
氧化硅(二氧化硅2 )和氧化铁(fe2 ?3在尘埃)是重要的,因为他们的磨料的性质。
the silicon oxide layer is formed by reacting a first gas mixture and a second gas mixture.
氧化硅层是由第一个反应气体混合物和第二气体混合物。
this paper describes the study on the component and structure of the silicon oxide and silicon nitride films by infra-red absorbed spectrum.
利用红外吸收谱等微观分析对氧化硅和氨化硅薄膜的成分和结构进行了研究。
the sol-gel technique is a new versatile tool to create transparent and well adhesive metal or silicon oxide films onto various textiles.
溶胶-凝胶技术是一种新型的通用技术,用于在不同织物上形成一种透明且具有良好附着力的金属或硅氧化物薄膜。
the researchers placed a silicon nitride waveguide on a transparent nanoporous silicon oxide substrate that they specially developed to have a much lower refractive index than that of the waveguide.
其做法是在纳米级氧化硅透明衬底上生长氮化硅波导,衬底的折射率远小于波导。
spherical nanoscale silicon oxide have been prepared by hydrothermal deposition process using silicon and silica as the starting materials.
以硅、二氧化硅为原料,采用水热沉积法制备了球状纳米硅氧化物。
the core materials consist of soluble phosphate binder, magnesium oxide hardener and high-purity silicon oxide as refractory aggregate materials.
这种芯料采用水溶性磷酸盐为粘结剂、氧化镁为固化剂、高纯二氧化硅为耐火骨料。
a thin silicon oxide encapsulation film was coated on the surface of ultra-fine phosphate glass particles for electronic paste by high frequency plasma polymerization of hexamethyldisiloxanc.
以六甲基二硅氧烷为单体,利用高频等离子体在超微细低熔磷酸盐玻璃粉体表面聚合硅氧聚合物包覆薄膜。
analysis by xps graph obtained silicon atom ratio of oxygen is about 1:1, the results showed that the films were annealed silicon oxide film is rich silicon oxide.
通过对xps图的分析得到硅氧的原子比大约是1:1,这个结果表明对薄膜进行退火后氧化硅薄膜是富硅氧化物。
silicon oxide nanoparticle are prepared by chemical precipitation process, with sodium metasilicate and hydrochloric acid as raw material.
以工业硅酸钠和盐酸为原料,采用化学沉淀法制备出纳米二氧化硅。
objective to develop oral mucosal ointment of organic silicon oxide and evaluate its matrix.
目的研制有机硅氧化物类口腔黏膜药膏及对其基质进行评价。
at the same time, the influence of plasma charging and ion bombardment on the quality of silicon oxide are analyzed.
我们同时对反应离子刻蚀工艺中的等离子体充电效应和离子轰击对氧化硅造成的损伤进行了讨论。
a method for forming a silicon oxide layer for use in integrated circuit fabrication is provided.
为形成了集成电路制造中使用的硅氧化层的方法提供。
this technique is fully compatible with conventional cmos processes by employing silicon oxide and photoresist to mask thick aluminum film during dry etching.
这种技术利用氧化硅和光刻胶双层复合掩模来掩蔽厚铝的干法刻蚀,完全兼容于cmos工艺;
a method of removing carbon doped silicon oxide between metal contacts is provided. a layer of the carbon doped silicon oxide is converted to a layer of silicon oxide by removing the carbon dopant.
一种用于除去金属接触间的碳掺杂氧化硅的方法,包含:(a)通过除去碳掺杂物将该碳掺杂氧化硅层转化为氧化硅层;
the surface of the scale graphite presented evenly-distributed hydrophilicity by using above two treating methods, which was propitious to the deposition of hydrated silicon oxide on the …
两种处理使石墨鳞片的表面具有均匀分布的亲水性,有利于水合氧化硅在石墨鳞片表面的均匀沉积,从而制备得到性能优异的新型颜料—— 随角异色效应颜料。
the effects of raw materials on the formation of silicon oxide nanospheres by hydrothermal deposition were investigated using si and sio2 as the silicon sources.
以硅、二氧化硅为硅源探讨了水热沉积条件下原料对硅氧化物纳米球形成的影响。
the experiment, the preparation of the active silicon oxide and the test of properties, is designed for the inorganic chemical experiment in department of chemistry.
本文介绍的活性二氧化硅的制备及性质实验是为化学专业无机化学实验课而设计的一个综合性实验。